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Vorlesungs- und Modulverzeichnis nach Studiengängen >> International Elective Modules, Hochschulpraktikum >>

  Optical Manufacturing Metrology (OMM)

Prof. Dr.-Ing. habil. Tino Hausotte

, ECTS-Studium, Sprache Englisch
Zeit und Ort: Mo 8:15 - 9:45, H17 Maschinenbau

Studienfächer / Studienrichtungen
WPF IP-BA 5-6 (ECTS-Credits: 2,5)
WPF AOT-GL ab 2 (ECTS-Credits: 2,5)
WPF IP-BA-S 5-6 (ECTS-Credits: 2,5)
WPF MB-MA-IP 2 (ECTS-Credits: 2,5)

Voraussetzungen / Organisatorisches

  • Introduction: manufacturing metrology and main task: fields of industrial metrology, main tasks (control the conformity, readjusting/correcting of process parameters), objectives and aims (ensure the function, interchangeability, correction parameters for manufacturing processes) • measuring, testing, monitoring • equipment in manufacturing metrology • optics (theories: quantum, wave, ray), effects, properties and principles of measurement
  • Geometrical tolerances: basic (GPS) Framework, duality principle and operations (partition, extraction, filtration, association, collection, construction) • definitions of geometric elements, standard geometrical elements • geometrical parameters of workpieces, classification system for form deviations • linear and angular dimensions (terms and definitions) • ISO-system for tolerances of linear sizes (terms and definitions, types of fits, code system) • symbols and drawing indication of geometrical tolerances • definition of form tolerances • datums • orientation, location and run-out tolerances • several essential specifications for GPS (CT, E, M, F) • surface texture parameters (determination, types)

  • Measurement and Evaluation Strategies: determination of measurement strategy, probing strategy and evaluation strategy (Minimum and recommended number of probing points, Nyquist‘s Criterion, probing of feature segments, evaluation criteria) • influences on the uncertainty of measurement results (uncertainty of measurement, Golden Rule)

  • Optical Principles and Components: Theories of optics • Geometrical optics (reflection, refraction, fibre optic components, ray tracing, lenses, aberration, beam splitter, mirrors, prisms, reflectors) • Wave optics (wave equations, polarisation, polarisers, beam-splitting polarisers, coherence and interference, diffraction ) • Quantum optics (spontaneous emission, light-emitting-diodes and detectors, stimulated emission, laser, photoelectric effect and detectors)

  • Tolerances of optical Components: reference wavelengths • testing areas and volumes • dimensioning of lenses and of edges, dimension and protective chamfers • specification of angle • material specification (stress birefringence, bubbles and other inclusions, inhomogeneities and striae) • surface treatment and coating

  • Scales and Encoders: Abbe comparator principal (traceability, 1th order and 2nd order error, Abbe comparator) • linear encoder (principle, Moiré-effect and reticle, detection of motion direction) • output signals and demodulation of encoder signals (counting and resolution enhancement) • reading head of encoders (imaging and interferential measuring principle, transmitted and reflected light) • reference marks • absolute encoders (U- and V-scanning and Gray code)

  • Interferometer for length measurements: interference and interferometer • Michelson-Interferometer • superposition of waves, Basics of the interference, Interference of light waves • homodyne and heterodyne principal • interference at a Michelson-Interferometer • interference of a homodyne interferometer • demodulation at a homodyne interferometer (dead path) • demodulation at a heterodyne Interferometer • refractive index of air (dependency, measurement) • coherence (spatial and temporal, interferograms with two monochromatic light, white light) • He-Ne-Laser (modes and mode distances, stability) • interferometer setups and adjustment

  • Interferometer for surface measurements: interference of equal inclination • interference of equal thickness • multiple beam interference • demodulation with phase shifting (principle, generation of phase shift, unwrapping) • application of Fizeau Interferometry • interference microscopes (setups, evaluation)

  • Optical Surface Measurements: microscope designs, measuring microscope • numerical aperture and resolution • focus variation • confocal microscope (principle, setups, laser-scanning microscope) • chromatic white-light sensor • laser autofocus method (characteristic curve, principles with astigmatic lens and Foucault knife) • summary: optical probing

Empfohlene Literatur
  • Yoshizawa, T.: Handbook of optical Metrology: Principles and Applications. Boca Raton, CRC Press, 2009
  • Gåsvik, K. J.: Optical metrology. New York, Wiley, 2002

  • Benteley, J. P.: Principles of Measurement Systems. Essex, Prentice Hall, 1995

  • International Vocabulary of Metrology – Basic and General Concepts and Associated Terms, VIM, 3rd edition, JCGM 200:2008

Internetlinks für weitere Information zum Thema Messtechnik

Language: English

Zusätzliche Informationen
Erwartete Teilnehmerzahl: 20
www: http://www.fmt.tf.fau.de/lehre/lehrveranstaltungen.php

Zugeordnete Lehrveranstaltungen
UE: Optical Manufacturing Metrology - Übung
Dozentinnen/Dozenten: Prof. Dr.-Ing. habil. Tino Hausotte, Dipl.-Ing. Bogdan Galovskyi, Dipl.-Ing. Andreas Loderer, Akad. Rat
Zeit und Ort: Fr 8:15 - 9:45, SR FAPS 0.035; Bemerkung zu Zeit und Ort: Am 02.05. und 30.05. fällt die Übung aus!
www: http://www.fmt.tf.fau.de/lehre/lehrveranstaltungen.php

Verwendung in folgenden UnivIS-Modulen
Startsemester SS 2014:
Optical Manufacturing Metrology (OMM)

Institution: Lehrstuhl für Fertigungsmesstechnik (FMT)
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